Jun 15, 2024  
Spring 2020 Catalog 
Spring 2020 Catalog [ARCHIVED CATALOG]

CH 222 - Organic Chemistry II

Credit Hours: 3

This course is a continuation of CH 220 which includes the structure, synthesis, and reaction of the following classes of organic compounds: alcohols;  ethers and epoxides;  conjugated systems and aromatic compounds;  aldehydes and ketones;  organic acids and their derivatives; and  amines and amides.   NMR and IR spectroscopic structural determination of organic molecules will also be discussed.

Course Outcomes
At the completion of this course, the student should be able to:

  • interpret infra-red, UV-vis, NMR and mass spectra, and derive actual structures from these spectra;
  • predict reaction products from the interaction of various reagents with acids, aldehydes, ketones, ethers, amines, heterocycles, amino acids and proteins, glycols and diazonium salts;
  • name the classes of organic compounds in accordance with the IUPAC system;
  • describe the mechanism of Aldol and Claissen condensations;
  • predict relative energies of molecular orbitals and demonstrate an understanding of LCAO-MO theory, including HOMO and LUMO concepts and constraints, especially in the production of commercial dyestuffs;
  • use radioactive tracers to elucidate mechanisms such as esterification;
  • describe the synthetic production of natural products, and their subsequent use in the creation of more esoteric molecules;
  • be conversant with the competing mechanisms of nucleophilic substitution as applied to more sophisticated systems;
  • predict the relative acidity (basicity) of carboxylic acids, alcohols, phenols and amines;
  • describe the production and properties of polymers, including isotactic, syndiotactic and atactic conformations;
  • predict products from Hoffmann Degradation;
  • compare and contrast relative strengths of various oxidative and reductive reagents; and
  • propose good synthetic routes to all of the above functional groups and families.

Prerequisites: CH 220
Corequisites: CH 223
F/S (C, N, S)