May 26, 2026  
2025-2026 Catalog 
    
2025-2026 Catalog

CH 222 - Organic Chemistry II


Credit Hours: 3

This course is a continuation of CH 220 which includes the structure, synthesis, and reaction of the following classes of organic compounds: alcohols;  ethers and epoxides;  conjugated systems and aromatic compounds;  aldehydes and ketones;  organic acids and their derivatives; and  amines and amides.   NMR and IR spectroscopic structural determination of organic molecules will also be discussed.

Course Outcomes
Upon completion of this course, the student will be able to:

  1. interpret infra-red, UV-vis, NMR, and mass spectra, and derive actual structures from these spectra;
  2. predict reaction products from the interaction of various reagents with acids, aldehydes, ketones, ethers, amines, heterocycles, amino acids and proteins, glycols and diazonium salts;
  3. name the classes of organic compounds in accordance with the IUPAC system;
  4. describe the mechanism of Aldol and Claissen condensations;
  5. predict relative energies of molecular orbitals and demonstrate an understanding of LCAO-MO theory, including HOMO and LUMO concepts and constraints, especially in the production of commercial dyestuffs;
  6. use radioactive tracers to elucidate mechanisms such as esterification;
  7. describe the synthetic production of natural products and their subsequent use in the creation of more esoteric molecules;
  8. be conversant with the competing mechanisms of nucleophilic substitution as applied to more sophisticated systems;
  9. predict the relative acidity (basicity) of carboxylic acids, alcohols, phenols, and amines;
  10. describe the production and properties of polymers, including isotactic, syndiotactic, and atactic conformations;
  11. predict products from Hoffmann Degradation;
  12. compare and contrast the relative strengths of various oxidative and reductive reagents; and
  13. propose good synthetic routes to all of the above functional groups and families.


Prerequisites: CH 220
Corequisites: CH 223
F/S (C, N, S)