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Oct 05, 2024
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2021-2022 Catalog [ARCHIVED CATALOG]
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NS 202 - Basic Nanotechnology Processes Credit Hours: 3
This course will introduce students to: top down, bottom up and hybrid nanofabrication; additive processes and sputtering; plasma, plasma setups and plasma deposition; subtractive processes and etching; RIE; wet etching; pattern transfer and lithography techniques; typical LPCVD systems for top down applications; 1D materials in bottom up applications; and physical vapor deposition.
Course Outcomes At the completion of the course, the student will be able to:
- describe main nanofabrication processes;
- run basic additive and subtractive nanotechnology processes and equipment;
- conduct pattern transfer and implement basic lithography techniques; and
- effectively and safely work as a member of technical team on laboratory assignments.
Prerequisites: NS 201 Corequisites: NS 206 F/S (N)
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