NS 205 - Patterning for Nanotechnology

Credit Hours: 3.0

This course will introduce students to the following topics: basics of photolithography; advanced lithography technologies such as antireflective coating, alignment and exposure systems, contact aligner, scanning projection aligner, electron beam lithography; photoresists; nanoimprint lithography; UV molding; edge lithography; probe lithography; block copolymer patterning.

Course Outcomes
At the completion of the course, the student will be able to:

demonstrate an understanding of basic lithography techniques;
describe advanced lithography techniques employed in the industry;
successfully apply photolithography techniques for pattern transfer; and
effectively and safely work as a member of technical team in laboratory setting.

Prerequisites: NS 201
Corequisites: NS 202, NS 203, NS 206
F/S (N)