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Oct 05, 2024
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2021-2022 Catalog [ARCHIVED CATALOG]
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NS 205 - Patterning for Nanotechnology Credit Hours: 3.0
This course will introduce students to the following topics: basics of photolithography; advanced lithography technologies such as antireflective coating, alignment and exposure systems, contact aligner, scanning projection aligner, electron beam lithography; photoresists; nanoimprint lithography; UV molding; edge lithography; probe lithography; block copolymer patterning.
Course Outcomes At the completion of the course, the student will be able to:
- demonstrate an understanding of basic lithography techniques;
- describe advanced lithography techniques employed in the industry;
- successfully apply photolithography techniques for pattern transfer; and
- effectively and safely work as a member of technical team in laboratory setting.
Prerequisites: NS 201 Corequisites: NS 202, NS 203, NS 206 F/S (N)
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